华西口腔医学杂志

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真空镀膜技术对新型牙用烤瓷支架钴铬合金金瓷结合强度影响的研究

吴峻岭1, 2, 巢永烈2, 汲平1, 高旭1   

  1. 1.山东大学口腔医院口腔修复科, 山东济南250012; 2.口腔生物医学工程教育部重点实验室, 四川大学, 四川成都610041
  • 收稿日期:2007-10-25 修回日期:2007-10-25 出版日期:2007-10-20 发布日期:2007-10-20
  • 通讯作者: 巢永烈,Tel:028- 85503570
  • 作者简介:吴峻岭(1977-), 男, 山东人, 主治医师,博士
  • 基金资助:

    高等学校博士学科点专项科研基金资助项目(200206-10066)

Effect of vacuum deposition technology on the metal - por celain bond str ength of a new type of Co - Cr cer amic and fr amework dental alloy

WU Jun- ling1,2, CHAO Yong- lie2, JI Ping1, GAO Xu1   

  1. 1. Dept. of Prosthodontics, College of Stomatology, Shandong University, Jinan 250012, China; 2. Key. Laboratory of Oral Biomedical Engineering of Ministry of Education, Sichuan University, Chengdu 610041, China
  • Received:2007-10-25 Revised:2007-10-25 Online:2007-10-20 Published:2007-10-20
  • Contact: CHAO Yong- lie,Tel:028- 85503570

摘要:

目的研究一种新的工程学真空镀膜技术———等离子磁控反应溅射技术对新型牙用烤瓷支架钴铬合金金瓷结合强度的影响。方法用DA9- 4烤瓷支架钴铬合金制成标准金属基片,并在金属基片上瓷前利用等离子磁控反应溅射技术在其表面溅射生成一层Al2O3陶瓷薄膜,对其表面形貌、结构、厚度进行分析;金属基片与VMK95瓷粉烧结形成标准三点弯曲试件,测定其结合强度,观察金瓷界面的形貌及元素分布情况。同时,以未进行溅射镀膜基片作为对照。结果溅射镀膜组金瓷结合强度为(180.55±16.45)MPa,对照组(143.80±24.49)MPa。经统计学分析,溅射镀膜后的金瓷结合强度明显高于对照组(P<0.01)。结论等离子磁控反应溅射技术有改善新型牙用烤瓷支架钴铬合金金瓷结合强度的作用。

关键词: 磁控反应溅射技术, 钴铬合金, 结合强度

Abstract:

Objective To investigate the effect of a new engineering technique of vacuum deposition - plasma magnetron reactive sputter deposition technique on the metal- porcelain bond strength of a new type of Co- Cr ceramic and framework dental alloy. Methods Before porcelain painted on the specimens, the standardized metal strips made from DA9- 4 dental alloy were coated with a thin Al2O3 ceramic film by plasma magnetron reactive sputter deposition technique. The conformation, structure and thickness of the ceramic film were analyzed. The specimens for three- point bending test made from DA9- 4 alloy and VMK95 porcelain were used for metal- porcelain bond strength measurement, in the same time the interface of metal- porcelain and element distribution were also observed. Results The flexural bonding strength of metal- porcelain of sputtering group and control group were(180.55±16.45)MPa and (143.80±24.49)MPa. The flexural bonding strength of metal - porcelain of sputtering group was higher than control group significantly through statistical analysis(P<0.01). Conclusion The plasma magnetron reactive sputter deposition technique has a positive effect in improving the bonding strength of DA9- 4 dental alloy and ceramic.

Key words: plasma magnetron reactive sputter deposition technique, cobalt- chromium alloy, bonding strength